INVESTIGATION OF THE STRUCTURE AND MECHANICAL PROPERTIES OF TIN COATINGS BY MAGNETRON SPUTTERING

Abstract

Great attention is paid to the study of new, different synthesized, combinational compounds and materials using magnetron sputtering methods. Using this method, it is possible to achieve the required level of purity of the applied ultrathin films at the nano-scale level.  In this review article, it is shown using the magnetron sputtering method to obtain film growth under a certain condition and the required composition of nanostructured TiN coatings, the structure and behavior of thin films of titanium nitride are studied. A series of experiments was carried out within the framework of studying the microstructure at the distance of the target-sample, which led to a change in the growth of the nanofilm, the grain size in the forming nanostructure during spraying.